MID UV Resist Materials Containing Pyridinium Ylides

Reinhold Schwalm; Andreas Bottcher; Horst Koch

doi:10.1117/12.968297

1 January 1988 MID UV Resist Materials Containing Pyridinium Ylides

Reinhold Schwalm, Andreas Bottcher, Horst Koch

Proceedings Volume 0920, Advances in Resist Technology and Processing V; (1988) https://doi.org/10.1117/12.968297
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Polymers containing pyridinium-ylide units were prepared as water soluble MID UV resist materials. The absorption maxima of the N-iminopyridinium ylides are centered around 320 nm. Upon exposure the ylide sensitizer bleaches cleanly and undergoes two competing reactions, leading via a singlet state to 1,2-diazepines and via a triplet state to pyridine and nitrenes. Both reactions are accompanied by a change in polarity and can be used in the application as photoresists. This pronounced polarity change renders the polymers hydrophobic and water repellant. Therefore negative images can be obtained by development with pure water. Due to a quantum yield below 0.1 the sensitivity is low, but can be enhanced by addition of sensitizers.

Citation Download Citation

Reinhold Schwalm, Andreas Bottcher, and Horst Koch "MID UV Resist Materials Containing Pyridinium Ylides", Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); https://doi.org/10.1117/12.968297

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