Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition

K. Pfeiffer; U. Schulz; A. Tünnermann; A. Szeghalmi

doi:10.1117/12.2250272

20 February 2017 Ta₂O₅/ Al₂O₃/ SiO₂ - antireflective coating for non-planar optical surfaces by atomic layer deposition

K. Pfeiffer, U. Schulz, A. Tünnermann, A. Szeghalmi

Proceedings Volume 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X; 1011513 (2017) https://doi.org/10.1117/12.2250272
Event: SPIE OPTO, 2017, San Francisco, California, United States

Abstract

Antireflective coatings are essential to improve transmittance of optical elements. Most research and development of AR coatings has been reported on a wide variety of plane optical surfaces; however, antireflection is also necessary on nonplanar optical surfaces. Physical vapor deposition (PVD), a common method for optical coatings, often results in thickness gradients on strongly curved surfaces, leading to a failure of the desired optical function. In this work, optical thin films of tantalum pentoxide, aluminum oxide and silicon dioxide were prepared by atomic layer deposition (ALD), which is based on self-limiting surface reactions. The results demonstrate that ALD optical layers can be deposited on both vertical and horizontal substrate surfaces with uniform thicknesses and the same optical properties. A Ta₂O₅/Al₂O₃/ SiO₂multilayer AR coating (400-700 nm) was successfully applied to a curved aspheric glass lens with a diameter of 50 mm and a center thickness of 25 mm.

Citation Download Citation

K. Pfeiffer, U. Schulz, A. Tünnermann, and A. Szeghalmi "Ta₂O₅/ Al₂O₃/ SiO₂ - antireflective coating for non-planar optical surfaces by atomic layer deposition", Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011513 (20 February 2017); https://doi.org/10.1117/12.2250272

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