Multilayer Optical Coating Fabrication By Ion Beam Sputter Deposition

J. Becker; V. Scheuer

doi:10.1117/12.950014

27 February 1989 Multilayer Optical Coating Fabrication By Ion Beam Sputter Deposition

J. Becker, V. Scheuer

Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950014
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Ion Beam Sputter Deposition (IBSD) was proven to be a useful technique for producing high performance optical coatings. However, compared to other deposition techniques, several problems remain to be solved, such as low deposition rates, small areas with homogeneous deposition rate and the problem of contamination. In the work described here, a cubic vacuum chamber has been equipped with a commercially available ion beam source, a triple stage target holder and a rotating substrate holder. The primary interest was to get a reasonable deposition rate over a sufficiently large area. Single layers of SiO2, Ta205 and TiO2 and multilayers of Si02/Ta205 were produced. Contaminants in the films were analyzed by various techniques mainly by Total-Reflection X-ray Fluorescence (TXRF). Optical properties of the coatings were investigated to study the influence of the contaminants on the performance of the optical coatings. The optical properties were characterized by the refractive index, the absorption coefficient and the scattering behaviour. Scattering losses were measured by means of Total Integrated Scattering (TIS) and Angle Resolved Scattering (ARS). The damage threshold against high-power laser pulses of 1.06 pm was determined.

Citation Download Citation

J. Becker and V. Scheuer "Multilayer Optical Coating Fabrication By Ion Beam Sputter Deposition", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950014

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