Paper
2 June 2017 Alkaline fuel cell with nitride membrane
Shen-Huei Sun, Moritz Pilaski, Jens Wartmann, Florian Letzkus, Benedikt Funke, Georg Dura, Angelika Heinzel
Author Affiliations +
Proceedings Volume 10246, Smart Sensors, Actuators, and MEMS VIII; 102460T (2017) https://doi.org/10.1117/12.2265689
Event: SPIE Microtechnologies, 2017, Barcelona, Spain
Abstract
The aim of this work is to fabricate patterned nitride membranes with Si-MEMS-technology as a platform to build up new membrane-electrode-assemblies (MEA) for alkaline fuel cell applications. Two 6-inch wafer processes based on chemical vapor deposition (CVD) were developed for the fabrication of separated nitride membranes with a nitride thickness up to 1 μm. The mechanical stability of the perforated nitride membrane has been adjusted in both processes either by embedding of subsequent ion implantation step or by optimizing the deposition process parameters. A nearly 100% yield of separated membranes of each deposition process was achieved with layer thickness from 150 nm to 1 μm and micro-channel pattern width of 1μm at a pitch of 3 μm. The process for membrane coating with electrolyte materials could be verified to build up MEA. Uniform membrane coating with channel filling was achieved after the optimization of speed controlled dip-coating method and the selection of dimethylsulfoxide (DMSO) as electrolyte solvent. Finally, silver as conductive material was defined for printing a conductive layer onto the MEA by Ink-Technology. With the established IR-thermography setup, characterizations of MEAs in terms of catalytic conversion were performed successfully. The results of this work show promise for build up a platform on wafer-level for high throughput experiments.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shen-Huei Sun, Moritz Pilaski, Jens Wartmann, Florian Letzkus, Benedikt Funke, Georg Dura, and Angelika Heinzel "Alkaline fuel cell with nitride membrane", Proc. SPIE 10246, Smart Sensors, Actuators, and MEMS VIII, 102460T (2 June 2017); https://doi.org/10.1117/12.2265689
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KEYWORDS
Semiconducting wafers

Low pressure chemical vapor deposition

Coating

Plasma enhanced chemical vapor deposition

Radiation thermography

Refractive index

Deposition processes

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