Paper
13 March 2018 Toward reliable and repeatable automated STEM-EDS metrology with high throughput
Zhenxin Zhong, Jason Donald, Gavin Dutrow, Justin Roller, Ozan Ugurlu, Martin Verheijen, Oleksii Bidiuk
Author Affiliations +
Abstract
New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhenxin Zhong, Jason Donald, Gavin Dutrow, Justin Roller, Ozan Ugurlu, Martin Verheijen, and Oleksii Bidiuk "Toward reliable and repeatable automated STEM-EDS metrology with high throughput", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105852X (13 March 2018); https://doi.org/10.1117/12.2297403
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Cited by 1 scholarly publication.
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KEYWORDS
Metrology

Signal to noise ratio

Scanning transmission electron microscopy

Electron beams

Image processing

X-rays

Logic

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