Enhancement of optical resistance in high reflectivity coatings using oblique angle deposition method

Tomas Tolenis; Lina Grinevičiūtė; Simonas Kičas; Rytis Buzelis

doi:10.1117/12.2323403

7 September 2018 Enhancement of optical resistance in high reflectivity coatings using oblique angle deposition method

Tomas Tolenis, Lina Grinevičiūtė, Simonas Kičas, Rytis Buzelis

Proceedings Volume 10731, Nanostructured Thin Films XI; 107310F (2018) https://doi.org/10.1117/12.2323403
Event: SPIE Nanoscience + Engineering, 2018, San Diego, California, United States

Abstract

Standard high reflectivity coatings consist of materials with high and low refractive indexes. Typically, optical resistivity of such elements is limited by the threshold value of material with high index. Combination of two deposition methods, namely ion-beam sputtering and oblique angle deposition, was used to form high reflectivity coatings for the wavelength of 355 nm. Variation of the design of standard coating and the number of top layers, deposited at oblique angle have been investigated. Laser induced damage thresholds, optical scattering, surface roughness, spectral performance etc. were tested for the experimental samples. Analysis indicate that combination of both deposition methods allows to enhance the optical resistivity of typical high reflictivity mirrors. Introducing standard method also allows to stabilize the spectra and reduce the losses of total optical component.

Citation Download Citation

Tomas Tolenis, Lina Grinevičiūtė, Simonas Kičas, and Rytis Buzelis "Enhancement of optical resistance in high reflectivity coatings using oblique angle deposition method", Proc. SPIE 10731, Nanostructured Thin Films XI, 107310F (7 September 2018); https://doi.org/10.1117/12.2323403

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