Paper
16 January 2019 A correction method on system error in null mirror during interferometric testing
Xi Chen, Peiji Guo, Wei Wang
Author Affiliations +
Proceedings Volume 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 108380N (2019) https://doi.org/10.1117/12.2505008
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China
Abstract
The causes of the system error in null mirror during interferometric testing was analyzed. The system error in null mirror were obtained by turning the tested surface in different angles along their optic axis. The corrective file was loaded into the interferometer measurement, so as to the system error can be removed directly when testing. Therefore, with this technique, the demands on the material, manufacturing, and assembly of null mirror is not so critical, and the test accuracy is improved observably.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xi Chen, Peiji Guo, and Wei Wang "A correction method on system error in null mirror during interferometric testing", Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108380N (16 January 2019); https://doi.org/10.1117/12.2505008
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KEYWORDS
Mirrors

Monochromatic aberrations

Aspheric lenses

Error analysis

Interferometry

Interferometers

Optics manufacturing

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