Evaluating Process Optimums for Production VLSI Lithography

Erik S. Brown; William C. Nelson; Gene Howland

doi:10.1117/12.953068

30 January 1989 Evaluating Process Optimums for Production VLSI Lithography

Erik S. Brown, William C. Nelson, Gene Howland

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953068
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A new statistical analysis technique will be shown for process comparisons and optimization in production photolithography. The experimental layout proposed allows for efficient collection of data off-line for calculation of a process index relating the 6 sigma repeatability to assumed specification limits for each experimental cell of a full factorial experiment. Appropriate blocking of the experiment and number of repeats used allows the process index to be compared to the process capability calculations in popular use throughout the semiconductor industry.

Citation Download Citation

Erik S. Brown, William C. Nelson, and Gene Howland "Evaluating Process Optimums for Production VLSI Lithography", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953068

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