Electron Beam Lithography Using A New Quadrupole Triplet

Shigeo Okayama

doi:10.1117/12.968516

1 August 1989 Electron Beam Lithography Using A New Quadrupole Triplet

Shigeo Okayama

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968516
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A new type of a quadrupole correction lens system with lower aperture aberration coefficients has been developed for electron beam lithography system. The new correction lens consists of three-stage electrostatic quadrupoles and two aperture electrodes placed between quadrupoles. An octupole field for correction of aperture aberration is automatically created and aligned with quadrupole field by supplying a voltage to the aperture electrode and has its peak near the edge portion of the quadrupole. A new type of mechanical construction of the quadrupole correction system is developed for realizing the high precision alignment of the electrodes. Optical properties of the new correction lens are exactly calculated by using the simulated potential distributions. Aperture aberration of the new correction lens can be corrected to better than 0.1 mm. The probe-forming properties of the new correction lens are confirmed from the secondary electron images.

Citation Download Citation

Shigeo Okayama "Electron Beam Lithography Using A New Quadrupole Triplet", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968516

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