Study on ablation threshold of fused silica glass by femtosecond laser induced backside wet etching

Jinlong Yu; Xiaoyan Sun; Youwang Hu; Dongmei Cui; Guowei Chen

doi:10.1117/12.2506061

15 November 2018 Study on ablation threshold of fused silica glass by femtosecond laser induced backside wet etching

Jinlong Yu, Xiaoyan Sun, Youwang Hu, Dongmei Cui, Guowei Chen

Proceedings Volume 10964, Tenth International Conference on Information Optics and Photonics; 1096442 (2018) https://doi.org/10.1117/12.2506061
Event: Tenth International Conference on Information Optics and Photonics (CIOP 2018), 2018, Beijing, China

Abstract

This article presents the research on the ablation threshold of fused silica glass processed by femtosecond laser in different environments, such as air, distilled water, and pure alcohol solution. At present, studies on ultra-short pulse lasers on materials mainly focus on the ablation threshold and material removal mechanism of specific materials. By analyzing the ablation threshold of the material, the laser processing efficiency can be greatly improved. Therefore, this paper mainly studied the material removal mechanism of fused silica and calculated the ablation threshold of fused silica in different environments. By analyzing the experimental results, we found that the surface-ablation threshold of fused silica glass can be relatively reduced in liquid environment relative to the air environment. Compared with distilled water, the surface-ablation threshold in pure alcohol solution can be significantly decreased. Besides, by comparing the results, the surface morphology quality in the liquid solutions is superior to the air. The research content of this article has given a certain theoretical guidance for the processing of transparent materials and laid a certain foundation for subsequent research work.

Citation Download Citation

Jinlong Yu, Xiaoyan Sun, Youwang Hu, Dongmei Cui, and Guowei Chen "Study on ablation threshold of fused silica glass by femtosecond laser induced backside wet etching", Proc. SPIE 10964, Tenth International Conference on Information Optics and Photonics, 1096442 (15 November 2018); https://doi.org/10.1117/12.2506061

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available