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6 November 2019 Preparation of MoS2 films for sensor applications
Bartłomiej Stonio, Piotr Firek, Andrzej Taube, Jan Szmidt
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Proceedings Volume 11176, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2019; 1117656 (2019) https://doi.org/10.1117/12.2536814
Event: Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2019, 2019, Wilga, Poland
Abstract
The paper presents a method of producing single layers of molybdenum disulphide on silicon substrates covered with a layer of 275nm silicon dioxide produced by means of thermal oxidation. MoS2 was obtained using the CVD (Chemical Vapor Deposition) technique, and the process parameters were the heating temperatures of the substrates - sulfur and molybdenum oxide, the carrier gas flow in the reactor and the deposition time. Subsequently, the obtained layers were characterized using optical microscopy, atomic force microscopy and Raman spectroscopy. The obtained parameters of layers allow in the future to use them in sensory techniques.
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Bartłomiej Stonio, Piotr Firek, Andrzej Taube, and Jan Szmidt "Preparation of MoS2 films for sensor applications", Proc. SPIE 11176, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2019, 1117656 (6 November 2019); https://doi.org/10.1117/12.2536814
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KEYWORDS
Molybdenum
Chemical vapor deposition
Sensors
Raman spectroscopy
Atomic force microscopy
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