172 nm patterning of optical components on polymers (Conference Presentation)

Andrey E. Mironov; Dane J. Sievers; Austin W. Steinforth; Jinhong Kim; Sung-Jin Park; James G. Eden

doi:10.1117/12.2546426

10 March 2020 172 nm patterning of optical components on polymers (Conference Presentation)

Andrey E. Mironov, Dane J. Sievers, Austin W. Steinforth, Jinhong Kim, Sung-Jin Park, James G. Eden

Proceedings Volume 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII; 112920T (2020) https://doi.org/10.1117/12.2546426
Event: SPIE OPTO, 2020, San Francisco, California, United States

Abstract

Gratings, Fresnel lenses, phase masks, and waveguides are among the optical components that have been fabricated by 172 nm irradiation of various polymers through photomasks. Intensities above ~ 70 mW/cm^2 are now commercially available at 172 nm with flat Xe2 lamps. Such optical fluences are capable of precisely (< 500 nm lateral and 20 nm depth resolution) ablating a wide range of polymers, including PMMA and ABS, thereby allowing for a variety of 3D optical and biomedical components to be realized economically by dry processing.

Conference Presentation

Citation Download Citation

Andrey E. Mironov, Dane J. Sievers, Austin W. Steinforth, Jinhong Kim, Sung-Jin Park, and James G. Eden "172 nm patterning of optical components on polymers (Conference Presentation)", Proc. SPIE 11292, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII, 112920T (10 March 2020); https://doi.org/10.1117/12.2546426

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