Presentation
9 March 2020 InGaN/AlGaInN quantum wells for low-threshold laser active region (Conference Presentation)
Hanlin Fu, Damir Borovac, Justin Goodrich, Onoriode Ogidi-Ekoko, Nelson Tansu
Author Affiliations +
Proceedings Volume 11301, Novel In-Plane Semiconductor Lasers XIX; 1130103 (2020) https://doi.org/10.1117/12.2548652
Event: SPIE OPTO, 2020, San Francisco, California, United States
Abstract
The self-consistent 6-band k∙p calculations of AlGaInN barriers surrounding the InGaN quantum well (QW) emitting at ~495 nm show ~ 30% increase in material gain and ~ 40% reduction in threshold current density, compared to the conventional InGaN / GaN QW structure. Following the guidance of our computational study, the InGaN / AlGaInN multiple QW structures with different AlGaInN alloy compositions lattice-matched to GaN are grown via MOVPE. The use of InGaN / AlInN QW structure resulted in improved luminescence, and the results of InGaN / AlGaInN with larger compositional range will also be presented.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hanlin Fu, Damir Borovac, Justin Goodrich, Onoriode Ogidi-Ekoko, and Nelson Tansu "InGaN/AlGaInN quantum wells for low-threshold laser active region (Conference Presentation)", Proc. SPIE 11301, Novel In-Plane Semiconductor Lasers XIX, 1130103 (9 March 2020); https://doi.org/10.1117/12.2548652
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KEYWORDS
Indium gallium nitride

Quantum wells

Gallium nitride

Heterojunctions

Luminescence

Optoelectronic devices

Optoelectronics

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