Recent advancements of III-N materials in probe scanning lithography and metrology (Conference Presentation)

Tito L. Busani; Ivo Rangelow

doi:10.1117/12.2555095

24 March 2020 Recent advancements of III-N materials in probe scanning lithography and metrology (Conference Presentation)

Tito L. Busani, Ivo Rangelow

Author Affiliations +

Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 1132409 (2020) https://doi.org/10.1117/12.2555095
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

The steady advance of nanotechnology from investigation to application and to manufacturing is increasing the demands on nanoscale metrology and lithography and surface chemical analysis. As dimensions shrink to the nano-scale, the available metrologies, necessary for any advanced manufacturing process, become limited. In this seminar we present how we can achieve state of the art results in nano lithography and metrology and possibly NSOM using functionalized III-N nanowires. We will show as, such a single wide-bandgap tip technology offers the functionality and versatility of several incumbent technologies in one single, universal, system.

Conference Presentation

Citation Download Citation

Tito L. Busani and Ivo Rangelow "Recent advancements of III-N materials in probe scanning lithography and metrology (Conference Presentation)", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 1132409 (24 March 2020); https://doi.org/10.1117/12.2555095

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