Kissing corner handling in advanced nodes

Harold Mendoza; Gazi Huda

doi:10.1117/12.2551698

23 March 2020 Kissing corner handling in advanced nodes

Harold Mendoza, Gazi Huda

Proceedings Volume 11328, Design-Process-Technology Co-optimization for Manufacturability XIV; 1132819 (2020) https://doi.org/10.1117/12.2551698
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

In the advanced nodes, abutted corners often referred to as kissing corners, are not physically printable using single layer photolithography techniques. In order to mitigate any downstream impact, the authors propose specific kissing corner handling methodologies in Mask Data Prep (MDP). In the layout, beveling is a method that can add or subtract shapes to either allow a resist feature to remain or space to resolve. Unlike functional active areas, Fill kissing corners can be proactively avoided by a correct-by-construction approach. Both these methodologies yield faster processing while improving the results without necessitating any design rule change.

Citation Download Citation

Harold Mendoza and Gazi Huda "Kissing corner handling in advanced nodes", Proc. SPIE 11328, Design-Process-Technology Co-optimization for Manufacturability XIV, 1132819 (23 March 2020); https://doi.org/10.1117/12.2551698

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