Directly modulated semiconductor lasers with surface high-order grating fabricated by standard photolithography

Pijie Ma; Fengxin Dong; Anjin Liu; Wanhua Zheng

doi:10.1117/12.2542187

18 December 2019 Directly modulated semiconductor lasers with surface high-order grating fabricated by standard photolithography

Pijie Ma, Fengxin Dong, Anjin Liu, Wanhua Zheng

Author Affiliations +

Proceedings Volume 11334, AOPC 2019: Optoelectronic Devices and Integration; and Terahertz Technology and Applications; 113340D (2019) https://doi.org/10.1117/12.2542187
Event: Applied Optics and Photonics China (AOPC2019), 2019, Beijing, China

Abstract

Directly modulated semiconductor lasers (DMLs) with surface high-order grating have been designed, fabricated and measured. The output powers under different temperatures were measured, and there are almost no kinks among all the light-power curves. The threshold current is 22 mA with a slope efficiency of 0.21 mW/mA at 25 ℃. The side-mode suppression ratio (SMSR) over 30 dB is achieved. The wavelength red-shifting caused by current-induced heating is at a ratio of 0.03 nm/mA. Small signal response of this kind of lasers with surface high-order grating was measured at 25 ℃ and the -3 dB bandwidth is 11 GHz.

Citation Download Citation

Pijie Ma, Fengxin Dong, Anjin Liu, and Wanhua Zheng "Directly modulated semiconductor lasers with surface high-order grating fabricated by standard photolithography", Proc. SPIE 11334, AOPC 2019: Optoelectronic Devices and Integration; and Terahertz Technology and Applications, 113340D (18 December 2019); https://doi.org/10.1117/12.2542187

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