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20 September 2020 Metrology and irradiation systems for accelerated testing of EUVL components
Jochen Vieker, Klaus Bergmann, Serhiy Danylyuk, Sascha Brose
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Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170T (2020) https://doi.org/10.1117/12.2573152
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only
Abstract
Fraunhofer ILT has been developing EUV sources for more than 2 decades and has been developing multitude of EUV applications in collaboration with RWTH Aachen University, e.g., EUV laboratory-scale lithography for patterning and resist testing with demonstrated resolution of 28 nm HP or EUV reflectometry for surface sensitive analysis. Newest is the Fraunhofer high Irradiance Tool (FIT) for accelerated testing of optical components. Outline specs include: EUV irradiance >40 W/cm², angle of incidence on sample <5°, spot diameter >1.8 mm, repetition rate up to 2.5 kHz (10 kHz multiplexed), EUV power at focus >3 W, clean and controllable sample atmosphere.
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Jochen Vieker, Klaus Bergmann, Serhiy Danylyuk, and Sascha Brose "Metrology and irradiation systems for accelerated testing of EUVL components", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170T (20 September 2020); https://doi.org/10.1117/12.2573152
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KEYWORDS
Extreme ultraviolet
Extreme ultraviolet lithography
Metrology
Atmospheric particles
Lithography
Optical components
Optical lithography
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