Free form data reduction for MPC

Dai Tsunoda; Yasuaki Horima; Yohei Torigoe; Brian Dillon; Adam Lyons; Tom Wallow; Kurt Wampler; Vincent Shu; Quan Zhang

doi:10.1117/12.2573132

20 September 2020 Free form data reduction for MPC

Dai Tsunoda, Yasuaki Horima, Yohei Torigoe, Brian Dillon, Adam Lyons, Tom Wallow, Kurt Wampler, Vincent Shu, Quan Zhang

Proceedings Volume 11518, Photomask Technology 2020; 115180P (2020) https://doi.org/10.1117/12.2573132
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

MPC computation time is basically in proportional to the number of vertices in the layout. ILT free form may have up to 15 times more vertices than conventional OPC output, which may lead to the ballooning of MPC processing time. Novel data simplification technique for ILT input has been developed. Simulation based verification will be presented.

Conference Presentation

Citation Download Citation

Dai Tsunoda, Yasuaki Horima, Yohei Torigoe, Brian Dillon, Adam Lyons, Tom Wallow, Kurt Wampler, Vincent Shu, and Quan Zhang "Free form data reduction for MPC", Proc. SPIE 11518, Photomask Technology 2020, 115180P (20 September 2020); https://doi.org/10.1117/12.2573132

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available