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22 February 2021 Patterning metal contacts and dopants on two-dimensional materials by thermal scanning probe lithography
Xiangyu Liu, Xiaorui Zheng, Edoardo Albisetti, Annalisa Calo’, Elisa Riedo
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Proceedings Volume 11610, Novel Patterning Technologies 2021; 1161019 (2021) https://doi.org/10.1117/12.2583555
Event: SPIE Advanced Lithography, 2021, Online Only
Abstract
Two-dimensional (2D) materials are attracting significant interests in the nanoelectronics community due to their various electrical properties, atomic-scale thickness, and mechanical flexibility. The current challenge to fabricate high performance 2D materials-based electronic devices is the poor quality of the metal contacts, the difficulty to pattern dopants, and the high fabrication cost. To overcome these challenges, here, we show that using thermal scanning probe lithography (t-SPL), record performing high-quality metal contacts can be fabricated cost-effectively on 2D materials, resulting in high performance 2D materials-based field effect transistors. Moreover, we show that by integrating t-SPL with a gas flow chamber, t-SPL can be used to achieve nanoscale bipolar doping of 2D materials. This t-SPL method opens a new way to cost-effectively fabricate high performance 2D materials-based nanoelectronic devices and can be easily scaled up using parallel probe arrays.
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Xiangyu Liu, Xiaorui Zheng, Edoardo Albisetti, Annalisa Calo’, and Elisa Riedo "Patterning metal contacts and dopants on two-dimensional materials by thermal scanning probe lithography", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161019 (22 February 2021); https://doi.org/10.1117/12.2583555
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KEYWORDS
Metals
Optical lithography
Field effect transistors
Scanning probe lithography
Electron beam lithography
Graphene
Doping
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