Advances in component synthesis leading to performance improvements for multi-trigger resist

Carmen Popescu; Greg O'Callaghan; Alex McClelland; John Roth; Edward Jackson; Philipp H. Fackler; Ralph Dammel; Mansour Moinpour; Kun Si; Alex P. G. Robinson

doi:10.1117/12.2600966

29 September 2021 Advances in component synthesis leading to performance improvements for multi-trigger resist

Carmen Popescu, Greg O'Callaghan, Alex McClelland, John Roth, Edward Jackson, Philipp H. Fackler, Ralph Dammel, Mansour Moinpour, Kun Si, Alex P. G. Robinson

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540P (2021) https://doi.org/10.1117/12.2600966
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

One approach for a novel EUV resist is the multi-trigger concept wherein a reaction will only occur when multiple elements of the resist are initiated concurrently and in close spatial proximity. We present results focused on the enhancement of the high-opacity MTR resist which shows a decrease in dose and improvement in Z-factor using a higher activation energy MTR molecule for pitch 32nm dense lines. We present pillars at p40 with a diameter of 24nm, dose of 72mJ/cm2, with a CDU of 2.63nm.

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Carmen Popescu, Greg O'Callaghan, Alex McClelland, John Roth, Edward Jackson, Philipp H. Fackler, Ralph Dammel, Mansour Moinpour, Kun Si, and Alex P. G. Robinson "Advances in component synthesis leading to performance improvements for multi-trigger resist", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540P (29 September 2021); https://doi.org/10.1117/12.2600966

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