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Additive manufacturing – specifically 3D laser lithography – has become a powerful technology for the fabrication of 3D objects with sub-micrometric resolution. This technique has already been applied in a broad range of fields, including metamaterials, biomedicine, and optics. However, there is a growing interest in the incorporation of new features or functionalities in the printed structures that can open up new opportunities in the field.1,2
The lecture will present our latest advances in the design of functional polymer based photoresists for 3D laser lithography. In particular, a new class of on-demand cleavable materials will be introduced that can be removed after being printed (subtractive manufacturing).3 Futhermore, new photoresists based on stimuli-responsive materials for the preparation of dynamic and programable microstructures will be presented. We believe that these new materials will have significant impact on future applications, where the advantages of high resolution additive and response on-demand can be combined.
[1] C. A. Spiegel, M. Hippler, A. Münschinger, M. Bastmeyer, C. Barner-Kowollik, M. Wegener, E. Blasco. Adv Funct Mater, 2020, 30, 1907615.
[2] C. Barner-Kowollik, M. Bastmeyer, E. Blasco, G. Delaittre, P. Mueller, B. Richter, M. Wegener. Angew Chem Int Ed, 56, 15828 (2017).
[3] R. Batchelor, T. Messer, M. Hippler, M. Wegener, C. Barner-Kowollik, E. Blasco. Adv Mater, 31, 1904085 (2019).
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