Polarization aberration in-situ measurement in lithography tools

Yuanhe Li; Jianhui Li; Yanqiu Li; Guodong Zhou

doi:10.1117/12.2604286

13 December 2021 Polarization aberration in-situ measurement in lithography tools

Yuanhe Li, Jianhui Li, Yanqiu Li, Guodong Zhou

Proceedings Volume 12073, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies; 120730O (2021) https://doi.org/10.1117/12.2604286
Event: Tenth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2021), 2021, Chengdu, China

Abstract

Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numericalaperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a threestep eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.

Citation Download Citation

Yuanhe Li, Jianhui Li, Yanqiu Li, and Guodong Zhou "Polarization aberration in-situ measurement in lithography tools", Proc. SPIE 12073, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies, 120730O (13 December 2021); https://doi.org/10.1117/12.2604286

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