Presentation + Paper
12 April 2023 Dynamic tuning of WSe2 exciton emission via laser annealing
Author Affiliations +
Proceedings Volume 12423, 2D Photonic Materials and Devices VI; 1242303 (2023) https://doi.org/10.1117/12.2649766
Event: SPIE OPTO, 2023, San Francisco, California, United States
Abstract
We present a strain engineering platform that allows the dynamic tuning of the emission wavelength of a monolayer WSe2. A large and localized strain was induced in monolayer 2D materials by patterning a photoresist layer with internal stress into two elliptical shapes with a finite gap in between, which is referred to as a dimer in this work. By applying laser annealing on the dimer stressor while monitoring the exciton emission, we demonstrate the capability to dynamically tune the emission wavelength of the bright exciton in the monolayer WSe2.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi Yu, John J. Eng, Kunze Lu, Manlin Luo, Bongkwon Son, Pratul Venkatesh, Wen Wei Lee, Yong Hao Tham, Weibo Gao, and Donguk Nam "Dynamic tuning of WSe2 exciton emission via laser annealing", Proc. SPIE 12423, 2D Photonic Materials and Devices VI, 1242303 (12 April 2023); https://doi.org/10.1117/12.2649766
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KEYWORDS
Emission wavelengths

Excitons

Monolayers

Annealing

Engineering

2D materials

Electron beam lithography

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