Numerous recent approaches have proven the efficacy of deep learning as a fast and efficient surrogate for various
lithography simulation use cases. However, a drawback of such approaches is the requirement of large amounts
of data, which is often difficult to obtain at advanced nodes. Different means to alleviate the data demands of
deep learning models have been devised, such as transfer learning from different technology nodes and active
data selection. Active data selection techniques tend to require large amounts of data to optimize and select.
In our previous work, we devised a more efficient implementation of transfer learning and detailed numerous
applications for EUV lithography. In this work, we expand on the data efficiency enhancements with domain
knowledge-based data selection and the use of alternative data generated by different modeling approaches.
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