Poster + Paper
31 May 2023 Reflectance biosensor platform using residual-layer-free nanoimprint lithography
Author Affiliations +
Conference Poster
Abstract
Nanoimprint lithography is the simple method using stamp and UV or thermal curable resins for nano-structures/patterns with low cost, high-throughput, and high resolution. Residual-layer free NIL provides good performance of micro/nano-scale structures functional arrangements with 2/3D layouts. We demonstrated nanohole patterns of 200 nm pore size using residual-layer-free NIL without further process for removing residual layers for reflectance biosensor. The reflectance peaks of gold substrate are enhanced to 8 times using the hexagonal hole patterns of diameter 200 nm, and pitch 400 nm. So, this substrate can be applied for immune reflectance biosensor with magnetic nanoparticles for pre-treatment.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junhyoung Ahn, Yunji Eom, Hakjong Choi, Soongeun Kwon, Seonju Yeo, Sua Park, Kee-Bong Choi, and JaeJong Lee "Reflectance biosensor platform using residual-layer-free nanoimprint lithography", Proc. SPIE 12572, Optical Sensors 2023, 125721E (31 May 2023); https://doi.org/10.1117/12.2665564
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KEYWORDS
Nanoimprint lithography

Reflectivity

Biosensors

Gold

Nanostructures

Gold nanoparticles

Magnetism

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