Optical reflectometry-based high-speed temperature change measurement of silicon wafer surfaces

Jinho Bae; Minji Hyun; Jinhee Hong; Youngeun Jeon; Sanghyun Son; Yongjun Seo; Sangmin Ha; Jungwon Kim

doi:10.1117/12.2673346

10 August 2023 Optical reflectometry-based high-speed temperature change measurement of silicon wafer surfaces

Jinho Bae, Minji Hyun, Jinhee Hong, Youngeun Jeon, Sanghyun Son, Yongjun Seo, Sangmin Ha, Jungwon Kim

Proceedings Volume 12618, Optical Measurement Systems for Industrial Inspection XIII; 1261827 (2023) https://doi.org/10.1117/12.2673346
Event: SPIE Optical Metrology, 2023, Munich, Germany

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(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Jinho Bae, Minji Hyun, Jinhee Hong, Youngeun Jeon, Sanghyun Son, Yongjun Seo, Sangmin Ha, and Jungwon Kim "Optical reflectometry-based high-speed temperature change measurement of silicon wafer surfaces", Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, 1261827 (10 August 2023); https://doi.org/10.1117/12.2673346

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