Characteristics of new KrF excimer laser resist

Takeshi Kotani; Mitsuhiko Sano; Kei-ichi Hayashi; Hideo Kikuchi

doi:10.1117/12.20101

1 June 1990 Characteristics of new KrF excimer laser resist

Takeshi Kotani, Mitsuhiko Sano, Kei-ichi Hayashi, Hideo Kikuchi

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20101
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

New alkali-soluble polymer which is highly transparent at 248nm were prepared. Alkali-dissolution rate, optical transmission at 248nm and RIE resistance of the polymer were studied. As a sensitizer, diazoketone compounds were newly synthesized and provided an intense bleachable absorbance at 248nm. The new KrF excimer laser positive resist (NEX) composed of the diazoketone as the sensitizer and the maleimide copolymer as the base polymer has been developed.

Citation Download Citation

Takeshi Kotani, Mitsuhiko Sano, Kei-ichi Hayashi, and Hideo Kikuchi "Characteristics of new KrF excimer laser resist", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20101

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