Presentation + Paper
13 March 2024 Eco-friendly soft nanoimprinting of TiO2 nanostructures with a large range of pattern heights
H. Ren, C. Chevalier, N. Crespo-Monteiro, A. Valour, N. Blanchard, D. Albertini, T. Benyattou, C. Jamois
Author Affiliations +
Abstract
Nanoimprint lithography (NIL) is nowadays the most popular and effective method to develop new environmentally-friendly and low-cost photonic nanodevices. Combined with titanium dioxide (TiO2) in the form of sol-gel, photonic nanostructures with low absorption and high refractive index can be produced, which can be of interest for many applications for which sustainability becomes increasingly important. In this paper, we present a patterning process based on soft NIL of TiO2 sol-gel, and show that the pattern transfer is almost perfect independently from the feature size, shape and height of the patterns. We also propose a low-temperature (400°C) calcination process to crystallize the TiO2 nanostructures, which leads to very similar crystalline structures to higher-temperature processes, and a vertical shrinkage of about 61% compared to the imprinted pattern. Using this environmentally-friendly combined soft-NIL + calcination process, we show that submicron patterns with heights above 300 nm can be obtained. Such a large pattern height, combined with the wide range of pattern shapes and dimensions that can be fabricated, opens the possibility of a wide diversity of designs for the eco-friendly fabrication of TiO2 nanostructures with highly-interesting photonic properties.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Ren, C. Chevalier, N. Crespo-Monteiro, A. Valour, N. Blanchard, D. Albertini, T. Benyattou, and C. Jamois "Eco-friendly soft nanoimprinting of TiO2 nanostructures with a large range of pattern heights", Proc. SPIE 12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, 1289809 (13 March 2024); https://doi.org/10.1117/12.3000169
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Nanoimprint lithography

Polydimethylsiloxane

Sol gels

Nanostructures

Shrinkage

Silicon

Fabrication

Back to Top