Layout simulation for directed self-assembly with chemo-epitaxy methodology

Shibing Wang; Yixiao Zhang; Jiechang Hou; Yuansheng Ma; Daman Khaira; Germain Fenger; Yuyang Sun; Bassem Hamieh; Boaz Alperson; Durairaj Baskaran; Md S. Rahman; Jerome Wandell; Youngjun Her

doi:10.1117/12.3010510

10 April 2024 Layout simulation for directed self-assembly with chemo-epitaxy methodology

Shibing Wang, Yixiao Zhang, Jiechang Hou, Yuansheng Ma, Daman Khaira, Germain Fenger, Yuyang Sun, Bassem Hamieh, Boaz Alperson, Durairaj Baskaran, Md S. Rahman, Jerome Wandell, Youngjun Her

Author Affiliations +

Proceedings Volume 12954, DTCO and Computational Patterning III; 129540W (2024) https://doi.org/10.1117/12.3010510
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

In this paper, we present a rigorous simulation engine for DSA chemo-epitaxy patterning processes. The model can be utilized to predict the post-process patterns for line space and hexagonal hole layouts. Traditional pitch-split and EUV pattern rectification process integration schemes are simulated. The model output for Line Edge Roughness (LER) and Pattern Placement Error (PPE) is compared to the experimental results. Finally, we will explore how to enable DSA-aware process-compliant designs, taking into account cut-mask considerations in the context of design rules.

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Citation Download Citation

Shibing Wang, Yixiao Zhang, Jiechang Hou, Yuansheng Ma, Daman Khaira, Germain Fenger, Yuyang Sun, Bassem Hamieh, Boaz Alperson, Durairaj Baskaran, Md S. Rahman, Jerome Wandell, and Youngjun Her "Layout simulation for directed self-assembly with chemo-epitaxy methodology", Proc. SPIE 12954, DTCO and Computational Patterning III, 129540W (10 April 2024); https://doi.org/10.1117/12.3010510

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