Estimation of overlay error using in-line subsurface scanning probe microscopy

Dipankar Mukherjee; Hamed Sadeghian; Henk Nijmeijer

doi:10.1117/12.3010950

9 April 2024 Estimation of overlay error using in-line subsurface scanning probe microscopy

Dipankar Mukherjee, Hamed Sadeghian, Henk Nijmeijer

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129550Q (2024) https://doi.org/10.1117/12.3010950
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

The overlay accuracy for current technology node of 3-D structures has to be precise down to a single-digit nanometer range. At those tiny dimensions, overlay errors can occur in the fabrication process ow, thereby impacting the chip yield and performance. With the current CMOS logic road-map, which involves multiple patterning, achieving more stringent overlay requirements becomes even more challenging. With multiple alignment layers it becomes difficult to have a reference metrology to estimate the error induced. Subsurface Scanning Probe Microscopy involving frequency-mixing scheme is a candidate that can cater to this need of reference metrology due to its ability to measure through several layers non-destructively. In this work, metrology investigation has been carried out on a wafer in which programmed overlay error has been introduced. SSPM is used to estimate the variation in overlay introduced, shedding light on achievable sensitivity and performance while scanning through different layers.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Dipankar Mukherjee, Hamed Sadeghian, and Henk Nijmeijer "Estimation of overlay error using in-line subsurface scanning probe microscopy", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129550Q (9 April 2024); https://doi.org/10.1117/12.3010950

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