While conventional ellipsometry is only applicable to homogeneous sample areas large enough to cover the illumination spot, imaging ellipsometry, combining ellipsometry and microscopy, offers a solution to this. It enables the local examination of polarization properties, yet it is not widely used in metrology, mostly due to a lack of proper evaluation methods.
We discuss approaches for an advanced evaluation of imaging Mueller matrix ellipsometry for nanometrological applications. This encompasses ways to evaluate Mueller matrix images without 3D simulations, using techniques inspired by machine learning, as well as the algorithmic treatment of thermal instabilities. Also, we discuss the applicability of plasmonic lenses (PL) for the advancement of ellipsometric methods. We developed a new design for PLs to enable higher fabrication rates for possible applications. Simulations showed that PLs significantly enhance the sensitivity of ellipsometric measurements to subwavelength structures.
This project 20FUN02 “POLight” has received funding from the EMPIR programme co-financed by the Participating States and from the European Union’s Horizon 2020 research and innovation programme.
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