Wafer defect detection based on adaptive multi-scale optical flow detection

Jiaxin Dou; Kang Wang; Wenshao Cheng

doi:10.1117/12.3023136

18 March 2024 Wafer defect detection based on adaptive multi-scale optical flow detection

Jiaxin Dou, Kang Wang, Wenshao Cheng

Proceedings Volume 13104, Advanced Fiber Laser Conference (AFL2023); 131042L (2024) https://doi.org/10.1117/12.3023136
Event: Advanced Fiber Laser Conference (AFL2023), 2023, Shenzhen, China

Abstract

As an important part of semiconductor manufacturing, wafer defect detection has been studied more and more. With the gradual maturity of computer technology, image processing based detection methods have been widely used in wafer defect detection. However, there are still many problems to be solved in semiconductor wafer defect detection under complex background. Therefore, a wafer defect detection method based on adaptive multi-scale optical flow detection is designed in this paper. The principle of optical flow detection is applied to defect detection. The horizontal difference between the graph to be identified through optical flow detection, which an well tolerate the difference caused by the defect types existing on the wafer can be effectively identified. Experimental results show that the proposed method can effectively improve the signal-to-noise ratio of wafer defect detection.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jiaxin Dou, Kang Wang, and Wenshao Cheng "Wafer defect detection based on adaptive multi-scale optical flow detection", Proc. SPIE 13104, Advanced Fiber Laser Conference (AFL2023), 131042L (18 March 2024); https://doi.org/10.1117/12.3023136

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