Statistical approach to optimizing advanced low-voltage SEM operation

Peter J. Apostolakis

doi:10.1117/12.44453

1 July 1991 Statistical approach to optimizing advanced low-voltage SEM operation

Peter J. Apostolakis

Proceedings Volume 1464, Integrated Circuit Metrology, Inspection, and Process Control V; (1991) https://doi.org/10.1117/12.44453
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The continuous reduction in the dimensions of IC features has resulted in the need for higher resolution metrology tools. Low voltage scanning electron microscopy has the advantages of offering high resolution and a large depth of field. In addition, its non-destructive nature yields itself to in-process metrology without sacrifice of product. In this investigation, an advanced field emission scanning electron microscope is employed in the determination of optimal conditions for the inspection and measurement of common device- grade thin films. Polysilicon and silicon nitride films are characterized using several statistical tools. A factorial design experiment is used to narrow the range of effective SEM conditions. Subsequent measurement batteries will address the stability of the film-SEM interaction over a series of measurements, and resolve the fine degrees in condition performance. A treatment of the long-term charging and dimensional growth effects is also included.

Citation Download Citation

Peter J. Apostolakis "Statistical approach to optimizing advanced low-voltage SEM operation", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44453

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