In-situ low-temperature and epitaxial growth of high-Tc superconducting films using oxygen-discharge-assisted laser ablation method

Yongchang Fan; Chengwu An; Dongsheng Lu; Zaiguang Li

doi:10.1117/12.47238

1 November 1991 In-situ low-temperature and epitaxial growth of high-T_c superconducting films using oxygen-discharge-assisted laser ablation method

Yongchang Fan, Chengwu An, Dongsheng Lu, Zaiguang Li

Author Affiliations +

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47238
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

High Tc superconducting films with zero resistance temperature of 91 K and critical current density about 10⁵ A/cm² at 77 K have been reproductively fabricated using oxygen discharge plasma-assisted excimer laser ablation method. Scanning electron micrographs and x-ray diffraction patterns of the films showed that these kinds of in situ prepared films had excellent epitaxial quality with its C axis oriented perpendicular to the substrate surface.

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Yongchang Fan, Chengwu An, Dongsheng Lu, and Zaiguang Li "In-situ low-temperature and epitaxial growth of high-T_c superconducting films using oxygen-discharge-assisted laser ablation method", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47238

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