LIF measurement of CH* radical state through chemical sputtering

Noriaki Asada; Masato Yasumoto; Nagao Kamijo

doi:10.1117/12.59309

14 May 1992 LIF measurement of CH* radical state through chemical sputtering

Noriaki Asada, Masato Yasumoto, Nagao Kamijo

Proceedings Volume 1636, Applied Spectroscopy in Materials Science II; (1992) https://doi.org/10.1117/12.59309
Event: OE/LASE '92, 1992, Los Angeles, CA, United States

Abstract

The detection of CH* radicals was made by the laser induced fluorescence method. CH* radicals were formed through chemical sputtering processes of isotropic graphite targets irradiated by hydrogen ions in the low keV range and at temperatures around 700K. Fluorescent spectra of CH* radicals induced by a flashlamp pumped dye pulse laser were obtained by a photo-multiplier tube as a function of wavelength. The detailed structure of the chemical and electronic states of CH* radicals can be extracted from highly resolved fluorescent spectra.

Citation Download Citation

Noriaki Asada, Masato Yasumoto, and Nagao Kamijo "LIF measurement of CH* radical state through chemical sputtering", Proc. SPIE 1636, Applied Spectroscopy in Materials Science II, (14 May 1992); https://doi.org/10.1117/12.59309

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