Diazonaphthoquinone-sensitized deep-UV resist materials

Seiki Fukunaga; Tomoyuki Kitaori; Hiroo Koyanagi; Shin'ichi Umeda; Kohtaro Nagasawa

doi:10.1117/12.59775

1 June 1992 Diazonaphthoquinone-sensitized deep-UV resist materials

Seiki Fukunaga, Tomoyuki Kitaori, Hiroo Koyanagi, Shin'ichi Umeda, Kohtaro Nagasawa

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59775
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

This paper describes novel diazonaphthoquinone-sensitized deep UV resist materials and a process for improving the pattern profile thereof; namely, incorporation of an alkaline treatment subsequent to the exposure in the processing.

Citation Download Citation

Seiki Fukunaga, Tomoyuki Kitaori, Hiroo Koyanagi, Shin'ichi Umeda, and Kohtaro Nagasawa "Diazonaphthoquinone-sensitized deep-UV resist materials", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59775

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