Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild; Jan H. C. Sedlacek

doi:10.1117/12.130357

1 June 1992 Laser-induced damage in pellicles at 193 nm

Mordechai Rothschild, Jan H. C. Sedlacek

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130357
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The effect of 193-nm excimer laser radiation on pellicles designed for 248-nm use has been studied. The pellicles are transparent at 193 nm as well. However, prolonged irradiation causes gradual thinning and eventual rupture of the pellicle. The rate of change depends on the fluence and on the total dose, but is not affected by the presence of atmospheric oxygen. Two-photon absorption plays an important role in the interaction between the laser and the pellicle material. Extrapolation to the -0.1 mJ cm”2/pulse fluences expected to be used in 193-nm steppers indicates that these pellicles will change little for several years in a full production environment

Citation Download Citation

Mordechai Rothschild and Jan H. C. Sedlacek "Laser-induced damage in pellicles at 193 nm", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130357

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