Paper
23 October 1992 Analysis of the effects of traversing torch and deposited layer thickness on particle deposition in the modified chemical vapor deposition process
Mansoo Choi, Kyung-Soon Park
Author Affiliations +
Proceedings Volume 1813, Optoelectronic Component Technologies; (1992) https://doi.org/10.1117/12.131253
Event: International Symposium on Optoelectronics in Computers, Communications, and Control, 1992, Hsinchu, Taiwan
Abstract
A study has been carried out for the particle deposition during the Modified Chemical Vapor Deposition (MCVD) process. The analysis includes thermophoretic particle transport in the gas flow inside the tube and heat transfer through the solid layer with considering variable properties for both gas and solid regions. A notable feature of the study is to consider the effects of the periodic heating due to repeatedly traversing of the torch including the effects of the increasing solid layer thickness as the particles deposit. The localized heating of the moving torch is modelled as a gaussian heat flux boundary condition on the tube wall and the surface temperature distribution and the deposition efficiency results in good agreement with the existing experimental data. Of particular interest are the effects of torch speeds and solid layer thicknesses on the efficiency and the rate of deposition of particles, and the tapered length.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mansoo Choi and Kyung-Soon Park "Analysis of the effects of traversing torch and deposited layer thickness on particle deposition in the modified chemical vapor deposition process", Proc. SPIE 1813, Optoelectronic Component Technologies, (23 October 1992); https://doi.org/10.1117/12.131253
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KEYWORDS
Particles

Solids

Heat flux

Chemical reactions

Data modeling

Deposition processes

Optoelectronic devices

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