Er-doped silicate glass films prepared by co-sputtering for optical amplifiers

Hong Koo Kim; Ching-Chung Li; Xiao Ming Fang; Gerald Nykolak; Philippe C. Becker

doi:10.1117/12.175265

2 May 1994 Er-doped silicate glass films prepared by co-sputtering for optical amplifiers

Hong Koo Kim, Ching-Chung Li, Xiao Ming Fang, Gerald Nykolak, Philippe C. Becker

Proceedings Volume 2149, Technologies for Optical Fiber Communications; (1994) https://doi.org/10.1117/12.175265
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

Er-doped glass thin films are drawing increasing attention for optical amplifiers suitable for integrated optic configuration. We have investigated deposition of highly Er-doped (mid 10¹⁹ atoms/cm³ silica films using Rf magnetron sputtering. Erbium was doped into the host material by cosputtering techniques. Deposited films (0.5 to 1.2-micrometers thick) were characterized by photoluminescence, secondary ion mass spectroscopy, and fluorescence decay measurements. We have also deposited Er-doped three component silicate glass (SiO₂ + Al₂O₃ + MgO) films to investigate the dependence of Er³⁺ luminescence on the host material's composition. Optimum anneal temperature for the silicate glass films was found to be lower than that for the silica films while the Er³⁺ luminescence intensity was slightly higher for the silicate glass case.

Citation Download Citation

Hong Koo Kim, Ching-Chung Li, Xiao Ming Fang, Gerald Nykolak, and Philippe C. Becker "Er-doped silicate glass films prepared by co-sputtering for optical amplifiers", Proc. SPIE 2149, Technologies for Optical Fiber Communications, (2 May 1994); https://doi.org/10.1117/12.175265

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