Refractometry of weakly absorbing multilayers via reflectometry

Emoeke Loerincz; Robert Klug

doi:10.1117/12.213186

23 June 1995 Refractometry of weakly absorbing multilayers via reflectometry

Emoeke Loerincz, Robert Klug

Proceedings Volume 2208, Refractometry; (1995) https://doi.org/10.1117/12.213186
Event: Refractometry: International Conference, 1994, Warsaw, Poland

Abstract

Simple reflection techniques for optical parameter determination of isotropic or anisotropic multilayers on a lower refractive index substrate are presented here. In case of weak absorption in at least one of the layers characteristic minima appear in the angular dependence of the reflectivity by computer fit of which the layer refractive indices and thicknesses can be determined. In case of a monolayer the achieved accuracy is better than the third and fourth decimal in the real and imaginary part of the refraction index, respectively. The fit of bi-layers has lower accuracy, but has the advantage of refractive index determination of non-absorbing layer(s) in the presence of a weakly absorbing auxiliary layer. Comparison between measured refractive indices by reflectometric and optical waveguiding methods shows agreement within 0.001.

Citation Download Citation

Emoeke Loerincz and Robert Klug "Refractometry of weakly absorbing multilayers via reflectometry", Proc. SPIE 2208, Refractometry, (23 June 1995); https://doi.org/10.1117/12.213186

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