Novel defect inspection method for the LSI mask pattern data

Touru Miyauchi; Kenichi Kobayashi; Kazumasa Shigematsu

doi:10.1117/12.191955

3 November 1994 Novel defect inspection method for the LSI mask pattern data

Touru Miyauchi, Kenichi Kobayashi, Kazumasa Shigematsu

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191955
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

It is difficult to inspect the accuracy of LSI mask pattern data processed with a data processing system and to decide whether logical operations and sizing have been performed correctly. We devised a method to inspect mask pattern data for reticle patterns. We compared two sets of mask pattern data, each set processed with a different algorithm. We monitored the system to check the design rules between the layers or for a single. To implement this method, we developed and combined two devices, PAVE and PATACON, and set up the New Conversion and Inspection System of Mask Pattern Data.

Citation Download Citation

Touru Miyauchi, Kenichi Kobayashi, and Kazumasa Shigematsu "Novel defect inspection method for the LSI mask pattern data", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191955

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