Fabrication of waveguide grating coupler with double-corrugation by ion beam etching technology

Yajun Li; Mai Xu; Olivier M. Parriaux

doi:10.1117/12.182030

5 August 1994 Fabrication of waveguide grating coupler with double corrugation by ion-beam etching technology

Yajun Li, Mai Xu, Olivier M. Parriaux

Proceedings Volume 2321, Second International Conference on Optoelectronic Science and Engineering '94; (1994) https://doi.org/10.1117/12.182030
Event: Optoelectronic Science and Engineering '94: International Conference, 1994, Beijing, China

Abstract

This paper reports the method and technology on the fabrication of grating coupler with double-corrugation on BK7 glass waveguide for operation at 780 nm wavelength. Twice ion beam etching has technologically made possible the fabrication of high-efficiency waveguide grating coupler.

Citation Download Citation

Yajun Li, Mai Xu, and Olivier M. Parriaux "Fabrication of waveguide grating coupler with double corrugation by ion-beam etching technology", Proc. SPIE 2321, Second International Conference on Optoelectronic Science and Engineering '94, (5 August 1994); https://doi.org/10.1117/12.182030

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