Chromium-based attenuated embedded shifter preproduction

Franklin D. Kalk; Roger H. French; H. Ufuk Alpay; Greg P. Hughes

doi:10.1117/12.195825

7 December 1994 Chromium-based attenuated embedded shifter preproduction

Franklin D. Kalk, Roger H. French, H. Ufuk Alpay, Greg P. Hughes

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195825
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

Attenuated embedded phase shifting photomask technology can improve lithography performance for both g-line and i-line steppers. Emphasis at i-line is shifting from development to production as lithographers integrate phase shifting masks into their processes. This paper describes pilot production of i-line and g-line, Cr-based, attenuated embedded phase shifter photoblanks and photomasks.

Citation Download Citation

Franklin D. Kalk, Roger H. French, H. Ufuk Alpay, and Greg P. Hughes "Chromium-based attenuated embedded shifter preproduction", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195825

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