Performance of IBM's EL-4 e-beam lithography system

James D. Rockrohr; R. Butsch; W. A. Enichen; Michael S. Gordon; Timothy R. Groves; John G. Hartley; Hans C. Pfeiffer

doi:10.1117/12.209156

19 May 1995 Performance of IBM's EL-4 e-beam lithography system

James D. Rockrohr, R. Butsch, W. A. Enichen, Michael S. Gordon, Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209156
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

IBM's latest electron beam mask maker, EL-4, is online at IBM's Advanced Mask Facility (AMF) in Essex Junction, Vermont. The EL-4 system is a 75KV shaped beam lithography system utilizing a Variable Axis Immersion Lens (VAIL) designed to produce 1X or NX masks for 0.25 micrometers lithography ground rules, extendable to 0.13 micrometers . It is currently producing NIST-style X-ray membrane masks with pattern sizes over 30 X 30 mm². This paper will give a brief description of the EL-4 tool and its operating features, specific measures used to enhance tool stability and accuracy, and measurement data from masks recently produced on the tool.

Citation Download Citation

James D. Rockrohr, R. Butsch, W. A. Enichen, Michael S. Gordon, Timothy R. Groves, John G. Hartley, and Hans C. Pfeiffer "Performance of IBM's EL-4 e-beam lithography system", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209156

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