Challenges to optomechanical design from x-ray interferometry and gamma-ray diffraction

Richard D. Deslattes Jr.; E. G. Kessler Jr.

doi:10.1117/12.218683

6 September 1995 Challenges to optomechanical design from x-ray interferometry and gamma-ray diffraction

Richard D. Deslattes Jr., E. G. Kessler Jr.

Proceedings Volume 2542, Optomechanical and Precision Instrument Design; (1995) https://doi.org/10.1117/12.218683
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Optical determination of the spatial period of monocrystalline silicon is a first step toward such diverse goals as an atom-based replacement for the artifact kilogram, reckoning the masses of certain elementary particles, and measurement of the molar Planck constant. The needed measurements are realized through microfringe interferometric precision with a presently achievable accuracy of the order ot 0.01 ppm. Application of such subnanometer standards to x-ray and particulary gamma-ray wavelength measurement requires accurate interferometric angle measurement nowadays effective at the sub-milli-arcsecond level. From results obtained to date, one can infer certain constraints on the future direction of subpicometer interferometry and sub-milli-arcsecond goniometry.

Citation Download Citation

Richard D. Deslattes Jr. and E. G. Kessler Jr. "Challenges to optomechanical design from x-ray interferometry and gamma-ray diffraction", Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); https://doi.org/10.1117/12.218683

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