Mask inspection and real-time linewidth measurements

Yair Eran; Gad Greenberg; Amnon Joseph

doi:10.1117/12.262800

27 December 1996 Mask inspection and real-time linewidth measurements

Yair Eran, Gad Greenberg, Amnon Joseph

Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262800
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

Controlling line width error is one of the most challenging tasks in mask production. Current methods for monitoring line width are based on either CD measurements or edge defect detection. Neither method guarantees the detection of line width errors with good sensitivity over the whole mask area. For example, a combination of small edge defect together with CD non-uniformity within the allowed tolerance, can yield a significant line width error, which will not be detected using conventional methods. In this paper we are presenting a new approach for line width error detection. The method, a new feature of Orbot's RT-8000 die-to-database Reticle Inspection System, is a sensitive detector that operates during the inspection of all the reticle's area. The detection is based on a comparison of measured line widths on both the database and the scanned image ofthe reticle. In section 2, the motivation for this new detector is driven. An analysis of various defect types, which are difficult to detected using edge detection approach or CD measurements, is presented. In section 3, the basic concept of the new approach is introduced together with a description of the new detector and it's characteristics. In section 4, the calibration process that took place in order to evaluate the sensitivity of the detector is described. The experimental results of this evaluation are reported in section 5.

Citation Download Citation

Yair Eran, Gad Greenberg, and Amnon Joseph "Mask inspection and real-time linewidth measurements", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262800

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available