Laser lithography technique to fabricate integrated optical elements by ion exchange in glass

Vincente Moreno de las Cuevas; Jose Ramon Salgueiro; Carlos Montero; Xesus Prieto; Jesus Linares

doi:10.1117/12.262433

20 December 1996 Laser lithography technique to fabricate integrated optical elements by ion exchange in glass

Vincente Moreno de las Cuevas, Jose Ramon Salgueiro, Carlos Montero, Xesus Prieto, Jesus Linares

Proceedings Volume 2954, Fiber Integrated Optics; (1996) https://doi.org/10.1117/12.262433
Event: Advanced Imaging and Network Technologies, 1996, Berlin, Germany

Abstract

A simple, effective and low cost laser writing lithographic system is presented. This system with a simple optical design and interferometric control of the alignment is able to produce smallest optical features as 1 micrometers wide with high quality edges to produce prototypes of integrated optical elements by ion exchange in research laboratories. Results of several kinds of mask that can be generated for this systems as well as some of the integrated elements produced are shown.

Citation Download Citation

Vincente Moreno de las Cuevas, Jose Ramon Salgueiro, Carlos Montero, Xesus Prieto, and Jesus Linares "Laser lithography technique to fabricate integrated optical elements by ion exchange in glass", Proc. SPIE 2954, Fiber Integrated Optics, (20 December 1996); https://doi.org/10.1117/12.262433

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