Topography description model for 3D exposure simulation

Mumit Khan; Srinivas B. Bollepalli; Franco Cerrina

doi:10.1117/12.276038

7 July 1997 Topography description model for 3D exposure simulation

Mumit Khan, Srinivas B. Bollepalli, Franco Cerrina

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276038
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

The problem of accurately describing the topography of a mask arose in x-ray lithography, when the absorber structures have dimensions of several hundred wavelengths and may have topography. However, the application of phase shifting structures and a refinement of the image formation calculation even in optical masks has recently raised the same issue for the case of optical lithography. This paper reports the design and implementation of Topography Description Model (TDM), a rule-based 3D topography generator that allows the user to describe the exposure system, such as a system comprising of mask, gap, resist and wafer. The paper illustrates some applications of TDM to real-world studies, such as studying the effect of absorber side-wall slope on the final image and optimizing XRL masks.

Citation Download Citation

Mumit Khan, Srinivas B. Bollepalli, and Franco Cerrina "Topography description model for 3D exposure simulation", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276038

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available