Ellipsometry for correctly determining the void fraction and true refractive index of thin films

Vladimir A. Tolmachev

doi:10.1117/12.271828

1 April 1997 Ellipsometry for correctly determining the void fraction and true refractive index of thin films

Vladimir A. Tolmachev

Proceedings Volume 3094, Polarimetry and Ellipsometry; (1997) https://doi.org/10.1117/12.271828
Event: Polarimetry and Ellipsometry, 1996, Kazimierz Dolny, Poland

Abstract

Using two measurements in vacuum and under condition for condensing water, one might more correctly determine the true refractive index N_true and porosity Q with Bruggeman's EMA. The characteristics of chamber-attachment to ellipsometer, algorithm and application samples of new method for SiO₂, ZrO₂, HfO₂, a-C:H, and In₂O₃-SnO₂ films are presented. It is found that the differences between measurements of an effective refractive index N_ef in air, in vacuum and with condensed water may be up to 0.09. The void fraction for these films are range from 0 to 0.277, Difference between N_true and N in air may be up to 0.036.

Citation Download Citation

Vladimir A. Tolmachev "Ellipsometry for correctly determining the void fraction and true refractive index of thin films", Proc. SPIE 3094, Polarimetry and Ellipsometry, (1 April 1997); https://doi.org/10.1117/12.271828

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