Damping of unsteady flows in the physical vapor transport process

Walter M. B. Duval; N. B. Singh; M. E. Glicksman

doi:10.1117/12.277721

7 July 1997 Damping of unsteady flows in the physical vapor transport process

Walter M. B. Duval, N. B. Singh, M. E. Glicksman

Proceedings Volume 3123, Materials Research in Low Gravity; (1997) https://doi.org/10.1117/12.277721
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

The dynamics of the flow field during physical vapor transport of mercurous chloride is analyzed computationally for practical crystal growth conditions to distinguish between unsteady flow and thermal stress as the cause of crystal inhomogeneity. We analyze the flow field over the parametric range of 1.56 multiplied by 10² less than or equal to Ra less than or equal to 2.08 multiplied by 10⁵, .011 less than or equal to Ar less than or equal to .112, and show that the effect of thermal stress as the cause of crystal inhomogeneity can be investigated by performing experiments with low aspect ratio enclosures for Ar less than .028 and Ra less than 2.4 multiplied by 10³ for which the flow becomes diffusive-advective. Dynamical characteristics of the flow field indicate a transition from chaotic flow Ra equals 2.08 multiplied by 10⁵ to steady flow Ra less than 1.4 multiplied by 10⁴ occurs through period doubling. A microgravity environment can be used effectively to grow high quality crystals, if thermal stresses are not the cause of crystal inhomogeneity, since unsteady flows are damped regardless of the aspect ratio of the enclosure.

Citation Download Citation

Walter M. B. Duval, N. B. Singh, and M. E. Glicksman "Damping of unsteady flows in the physical vapor transport process", Proc. SPIE 3123, Materials Research in Low Gravity, (7 July 1997); https://doi.org/10.1117/12.277721

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